Kontakt
Ako nakupovať
Doručenie
Nákupný poradca
CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
Angličtina
290 b
30 dní na vrátenie tovaru
Zákazníci tiež kúpili
/
Brožovaná
33.88
€
To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.
Informácie o knihe
Angličtina
Darujte túto knihu ešte dnes
Je to jednoduché
1 Pridajte knihu do košíka a vyberte možnosť doručiť ako darček 2 Obratom Vám zašleme poukaz 3 Knihu zašleme na adresu obdarovanéhoMohlo by vás tiež zaujímať
Ahoj! Som Libroamiko, tvoj knižný radca.
Ako ti môžem pomôcť?