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Recent Developments in Oxide and Metal Epitaxy – Theory and Experiment: Volume 619

Jazyk AngličtinaAngličtina
Kniha Pevná
Kniha Recent Developments in Oxide and Metal Epitaxy – Theory and Experiment: Volume 619 Mark YeadonShirley ChiangRobin f. C. FarrowJames W. Evans
Libristo kód: 02060255
Nakladateľstvo Cambridge University Press, december 2000
Thin-film epitaxy is integral to many current and emerging technologies, and continued progress in s... Celý popis
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Thin-film epitaxy is integral to many current and emerging technologies, and continued progress in solving critical issues is essential to the realization of new devices. This book focuses on progress in solving fundamental issues in the epitaxial growth of metals and oxides. Insights from both experiment, and modeling are combined to facilitate cross fertilization of ideas and understanding. Highlighted is the use of in situ characterization techniques for enhancing the efficiency of materials development. Thin-film research is often empirical in nature. Techniques for minimizing the time spent exploring the complex parameter space in order to optimize growth and processing conditions are of particular value. Among the techniques discussed are spectroscopic ellipsometry and ion scattering and recoil spectrometry, LEEM (low-energy electron microscopy), STM (scanning tunneling microscopy), TEM (transmission electron microscopy) and RHEED (reflection high-energy electron diffraction). Topics include: growth and dynamics of metal films; structure and oxidation of metal films and surfaces; in situ studies of oxide growth and epitaxial growth of oxides.

Informácie o knihe

Celý názov Recent Developments in Oxide and Metal Epitaxy – Theory and Experiment: Volume 619
Jazyk Angličtina
Väzba Kniha - Pevná
Dátum vydania 2000
Počet strán 240
EAN 9781558995277
ISBN 1558995277
Libristo kód 02060255
Nakladateľstvo Cambridge University Press
Váha 490
Rozmery 152 x 229 x 14
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